Equipment Function: By precisely controlling laser energy, selective etching is performed on the ITO (Indium Tin Oxide) transparent conductive layer of the dimming film to form insulating lines or patterns of specific shapes.
Product Description
Equipment Function: By precisely controlling laser energy, selective etching is performed on the ITO (Indium Tin Oxide) transparent conductive layer of the dimming film to form insulating lines or patterns of specific shapes. This process divides the originally continuous conductive layer into multiple electrically isolated zones, each of which can be driven independently, thereby achieving zoned dimming functionality.
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Compared to traditional chemical etching processes, laser etching offers significant advantages such as maskless operation, simplified process, flexible pattern modification, and environmental friendliness with no waste liquid. Furthermore, by optimizing laser parameters, selective removal of the ITO layer can be achieved without damaging the underlying PET or glass substrate, ensuring that key optical indicators such as light transmittance and haze of the dimming film remain unaffected.
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Wide Application Areas: Primarily used in PDLC smart films, SPD smart films, and EC electrochromic smart glass applications.
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Sample Images

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Equipment Parameters
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Product Name |
Smart film zoning laser patterning equipment |
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Processing Size |
1000*1000mm, customizable |
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Accuracy |
XY axis positioning accuracy |
±0.003 |
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XY axis repeatability accuracy (mm) |
±0.002 |
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Z axis positioning accuracy (mm) |
±0.01 |
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Z axis repeatability accuracy (mm) |
±0.005 |
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Laser Source |
Laser type |
UV picosecond / infrared femtosecond laser |
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Laser power (W) |
≥10W |
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Process Parameters |
Processing line width (mm)? |
35±5um |
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Post-etching insulation resistance(?(MΩ)) |
≥50 |
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Overall Processing Accuracy |
≤0.03mm |
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Processing Speed |
≥100mm/s |
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Equipment Dimensions |
2550*2550*2200 (length, width, height) |
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Weight |
Approximately 4 tons |
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