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Laser Scribing Machine

A laser scribing machine is a high-precision, non-contact laser processing system used to cut, isolate, or pattern thin-film materials—especially in perovskite solar cells and flexible electronics. As a core component of an advanced laser patterning system, it enables accurate execution of P1, P2, and P3 scribing steps, critical for cell efficiency and module integrity. Our laser scribing solutions—also referred to as laser scribe machines—feature micron-level accuracy, automated alignment, and multi-wavelength laser compatibility, making them ideal for high-speed, low-damage processing in both R&D and industrial-scale production environments.

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Laser Scribing Machine Working Principle

Laser scribing machine operates by focusing a high-energy laser beam onto the surface of a material to perform precise micro-patterning, cutting, or isolation. The laser beam is controlled by galvanometer scanners or precision motion stages, enabling the system to selectively ablate thin-film layers without mechanical contact. Depending on the application, different laser types (such as UV, green, or IR with nanosecond to femtosecond pulse widths) are used to tailor energy absorption and minimize thermal damage.

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Laser Patterning System Products

Product Name Main Function / Application Key Difference Core Advantages
Thin-Film Solar Module Laser Scribing Experimental System R&D and small-scale laser scribing (P1, P2, P3 lines) Optimized for experimental flexibility and multi-material compatibility Highly adjustable parameters; ideal for lab testing and pilot lines
Thin-Film Solar Panel P4 Laser Edge Cleaning System Laser cleaning at the module edge (P4 process) Specialized for insulation and edge defect removal Prevents leakage, improves module reliability
Laser Scribing Mass Production System for Thin-Film Solar Modules High-speed laser scribing (P1–P3) for industrial lines Built for 24/7 operation in mass production Stable performance; fast throughput; low maintenance
Glove Box Type Laser Scribing and Edge Cleaning Machine Inert environment scribing/cleaning for sensitive films Operates inside glove box under N2/argon Suitable for perovskite and oxygen-sensitive materials
Thin Film Solar Panel Glass Cutting & Breaking System Laser cutting and mechanical breaking of substrate glass Targets precision glass handling Smooth edge cutting, reduced cracking risk
Fully Automatic Marking & Cleaning & Cutting & Splitting System Integrated marking, cleaning, splitting in one station All-in-one final module processing system Increases efficiency, reduces labor and alignment errors
Automatic Edge Cleaning System for Stacked Silicon Wafers Laser removal of edge contamination in stacked wafers Designed for HJT and tandem cell stacks No contact cleaning; preserves wafer quality
Silicon Wafer Non-Destructive and Lossy Cutting Equipment Wafer dicing with minimal thermal/physical damage Targets fragile or ultra-thin wafers High yield, precision cut, low debris

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Laser Scribing Machine Advantages

——Compared to traditional mechanical scribing

  • Precision: Laser scribing achieves line widths as narrow as 10–20 μm, versus 50–100 μm for mechanical methods.

  • Speed: Typical laser scribing speed reaches 300–1,000 mm/s, enabling high-throughput production.

  • Non-contact: Eliminates tool wear and physical damage, improving yield and reducing maintenance.

  • Thermal control: Especially with femtosecond lasers, the heat-affected zone is limited to <1 μm, compared to several microns in mechanical or longer-pulse laser systems.

  • Flexibility: Easily reprogrammed for different patterns without physical tooling changes.

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Laser Patterning System?Application Fields

  • Perovskite and CIGS thin-film solar modules

  • Tandem cells and heterojunction (HJT) solar cells

  • Semiconductor wafer dicing and packaging

  • Glass-based module manufacturing and smart module design

  • Clean energy research institutions and pilot lines

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Why Choose Microtreat?

  • Over 70% market share in China’s perovskite laser equipment segment

  • Joint lead in national-level photovoltaic industrialization R&D project

  • 2,500+ m2 cleanroom production facility

  • Full support for global thin-film solar and semiconductor manufacturers

  • Products aligned with “3060 Dual Carbon” clean energy policy

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Perovskite Solar Cell Industry

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