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Home- Products- New Energy- Film photovoltaic mass production line tracing test machine

Film photovoltaic mass production line tracing test machine

Equipment Functions: The equipment includes six processes: P1 (bottom electrode layer patterning), P2 (functional layer windowing), P3 (back electrode layer isolation), P4 (edge ??cleaning), P5 (BIPV), and P6 (slitting into smaller pieces). It supports substrate processing of 1200mm × 2400mm and even larger substrates.

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Product Description

Film Photovoltaic Mass Production Line Tracing Test MachineThe equipment includes six processes: P1 (bottom electrode layer patterning), P2 (functional layer windowing), P3 (back electrode layer isolation), P4 (edge ??cleaning), P5 (BIPV), and P6 (slitting into smaller pieces). It supports substrate processing of 1200mm × 2400mm and even larger substrates. To achieve rapid production on ultra-large substrates, the equipment employs advanced optical beam splitting technology.? It supports 24 or even 36 laser beams simultaneously for scribing, significantly shortening the production cycle time ?of a single module to 40 seconds or even faster, meeting the capacity requirements of GW-level production lines.

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Wide Application Areas:? Perovskite solar cells, OPV solar cells, cadmium telluride cells, and other thin-film solar cells.

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Sample Images

Film Photovoltaic Mass Production Line Tracing Test Machine

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Equipment Parameters

Product Name

Film Photovoltaic Mass Production Line Tracing Test Machine

Finish Size

1200*2400mm,1200*600mm,

Accuracy

XY axis positioning accuracy (mm)

±0.003

XY repositioning accuracy (mm)

±0.002

Z-axis positioning accuracy (mm)

±0.01

Z Repositioning Accuracy (mm)

±0.005

Laser

P1 laser type

Infrared nanosecond/infrared picosecond

P1 laser power (W)

≥50W

P2/P3 laser type

Green light picosecond/ultraviolet picosecond

P2/P3 laser power (W)

≥30W

P4 laser type

Infrared nanosecond

P4 laser power (W)

≥1000W

Process Parameters

Number of spectral channels

Routes 6–24

Processing speed (mm/s)

≤1000mm/s

Working width (μm)

≥20 (customizable according to P123 line width)

Processing heat effect (μm)

≤10

Processing position accuracy (μm)

≤±10

Clear edge resistance detection (G Ω)

≥4

Outline Dimension

11500*5400*2800 (length, width, height)

Weight

Approximately 10 tons

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Contact Us

Contact Us

E-mail: mkxn@szmicrotreat.com

Tel.: +86 512 8391 9217

Tel.: +86 173 1528 3532

Tel.: +86 188 6210 4169

WhatsApp: +8618015504961

Add.: Unit 101, Building 63, Suzhou Nano City, No. 99 Jinji Lake Avenue, Suzhou Industrial Park, Suzhou

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